Electron spin resonance observation of the Si(111)-(7 × 7) surface and its oxidation process

Physical Review Letters

Volumn 86, Issue 6, 2001, Pages 1054-1057

  Umeda, Takahide ^a,b   Nishizawa, Masayasu ^a   Yasuda, Tetsuji ^a   Isoya, Junichi ^a   Yamasaki, Satoshi ^a   Tanaka, Kazunobu ^a  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

^b NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; INTERFACES (MATERIALS); OXIDATION; SEMICONDUCTING SILICON; SILICA; SURFACE STRUCTURE; THICKNESS MEASUREMENT;

DANGLING BOND STATES; MOLECULAR OXYGEN;

ELECTRON SPIN RESONANCE SPECTROSCOPY;

EID: 19244381334     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.86.1054     Document Type: Article

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