Evaluation of sio2 aerogel thin film with ultra low dielectric constant as an intermetal dielectric

Microelectronic Engineering

Volumn 33, Issue 1-4, 1997, Pages 343-348

  Jo, Moon Ho ^a   Hong, Jung Kyun ^a   Park, Hyung Ho ^a   Kim, Joong Jung ^a   Hyun, Sang Hun ^a  

^a Yonsei University   (South Korea)

Author keywords

Aerogel; Intermetal dielectric; Low dielectric; SiO2; Supercritical drying

Indexed keywords

COATING TECHNIQUES; DEHYDRATION; DIELECTRIC FILMS; DRYING; PERMITTIVITY; POROSITY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING INTERMETALLICS; SILICA;

SILICON DIOXIDE AEROGEL THIN FILMS; SPIN COATING; THERMAL DEHYDRATION;

THIN FILMS;

EID: 0001151845     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0167-9317(96)00063-9     Document Type: Article

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