New methodologies for measuring film thickness, coverage, and topography

IEEE Transactions on Magnetics

Volumn 36, Issue 1 PART 1, 2000, Pages 110-114

  Mathew Mate, C ^a   Yen, Bing K ^a   Miller, Dolores C ^b   Toney, Mike F ^b   Scarpulla, Mike ^b   Frommer, Jane E ^b  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b BROWN UNIVERSITY   (United States)

Author keywords

Atomic force microscopy; Electron spectroscopy for chemical anylsis; Thin films; X ray reflectivity

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON INORGANIC COMPOUNDS; COMPOSITION; ELECTROMAGNETIC WAVE REFLECTION; ELECTRON SPECTROSCOPY; FILM PREPARATION; MAGNETIC DISK STORAGE; SPUTTER DEPOSITION; SUBSTRATES; SURFACE ROUGHNESS; THICKNESS MEASUREMENT;

ELECTRON SPECTROSCOPY FOR CHEMICAL ANALYSIS; METAL OXIDE LAYER; ULTRATHIN AMORPHOUS NITROGENATED CARBON; X RAY REFLECTIVITY;

MAGNETIC THIN FILMS;

EID: 0033871054     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.824434     Document Type: Article

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