Enhanced resistance to metal induced crystallization of amorphous Ge in contact with Bi

Applied Physics Letters

Volumn 69, Issue 14, 1996, Pages 2039-2041

  Missana, T ^a   Afonso, C N ^a   Petford Long, A K ^b   Doole, R C ^b  

^a INSTITUTO DE ÓPTICA   (Spain)

^b UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001242494     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116872     Document Type: Article

References (18)

1. F. Oki, Y. Ogawa, and Y. Fujiki, Jpn. J. Appl. Phys. 8, 1056 (1969).
2. S. R. Herd, P. Chaudari, and M. H. Brodsky, J. Non-Cryst. Solids 7, 309 (1972).
3. T. J. Konno and R. Sinclair, Philos. Mag. B 71, 163 (1995).
4. T. J. Konno and R. Sinclair, Philos. Mag. B 66, 749 (1992).
5. H. Jian-guo and W. Zi-qin, Phys. Rev. B 42, 3271 (1990).
6. S. Wang and E. Ong, J. Vac. Sci. Technol. B 10, 149 (1992).
7. S. Vitta, A. L. Greer, and R. E. Somekh, Mater. Sci. Eng. 98, 105 (1988).
8. R. T. Young and R. F. Wood, Annu. Rev. Mater. Sci. 12, 323 (1982).
9. H. Watanabe, H. Miki, S. Sugai, K. Kawasaki, and T. Kioka, Jpn. J. Appl. Phys. 33, 4491 (1994).
10. T. Missana and C. N. Afonso, Appl. Phys. A 62, 513 (1996).
11. A. K. Petford-Long, R. C. Doole, C. N. Afonso, and J. Solis, J. Appl. Phys. 77, 607 (1995).
12. Binary Alloys Phase Diagrams, edited by B. Thaddeus, J. L. Murray, L. H. Bennett, and H. Baker (American Society for Metals, Metals Park, OH, 1986).
13. T. Missana, C. N. Afonso, and M. F. Da Silva, Appl. Phys. A 56, 633 (1994).
14. T. Missana, C. N. Afonso, A. K. Petford-Long, and R. C. Doole (unpublished).
15. F. Vega, R. Serna, C. N. Afonso, D. Bermejo, and G. Tejeda, J. Appl. Phys. 75, 7287 (1994).
16. F. Haessner, in Recrystallization of Metallic Materials, edited by F. Haessner (Springer, Stuttgart, 1978). Chap. 1.
17. C. V. Thompson, Annu. Rev. Mater. Sci. 20, 245 (1990).
18. Thin Film Interdiffusion and Reactions, edited by J. M. Poate, K. N. Tu, and J. W. Mayer (Wiley, New York, 1978).