Surface quality of tribochemically polished silicon nitride

Journal of the Electrochemical Society

Volumn 146, Issue 4, 1999, Pages 1505-1509

  Hah, S R ^a   Burk, C B ^b   Fischer, T E ^a  

^a STEVENS INSTITUTE OF TECHNOLOGY   (United States)

^b Norton Advanced Ceramics   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHROMIUM; COMPRESSIVE STRESS; ELECTROLYTIC POLISHING; OPTICAL MICROSCOPY; PHOTOELECTRON SPECTROSCOPY; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SURFACE PROPERTIES; SURFACE ROUGHNESS; TRIBOLOGY;

BIAXIAL STRESS; CHROMIC ACID; NOMARSKI DIFFERENTIAL INTERFERENCE CONTRAST; STYLUS PROFILOMETRY; SURFACE QUALITY;

SILICON NITRIDE;

EID: 0032661099     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391795     Document Type: Article

References (16)

1. S. R. Hah and T. E. Fischer, J. Electrochem. Soc., 145, 1708 (1998).
2. T. E. Fischer, J. J. Wei, and S. R. Hah, Patent application (1998).
3. T. E. Fischer and H. Tomizawa, Wear, 105, 29 (1985).
4. H. Vora, T. W. Orent, and R. J. Stokes, J. Am. Ceram. Soc., 65, C-140 (1982).
5. T. Uematsu, K. Suzuki, M. H. Wu, O. Imanaka, and K. Suzuki, NIST Special Publ., 847, 409 (1993).
6. W. L. C. M. Heyboer, G. A. C. M. Spierings, and J. E. A. M. van den Meerakker, J. Electrochem. Soc., 138, 774 (1991).
7. E. Lee, J. Roh, and H. Im, Thin Solid Films, 205, 246 (1991).
8. J. W. Lucek, ASME 90-GT-165, 1990, 114 (1990).
9. I.E. O. Ovri and T. J. Davis, J. Mater. Sci. Lett., 6, 849 (1987).
10. W. J. Tomlinson and R. C. Newton, Ceram. Int., 16, 253 (1990).
11. R. A. Hanson, Inside Bearings, 2, 1 (1986).
12. M.E. Hilliy, J. A. Larson, C. F. Jatczak, and R. E. Ricklefs, Residual Stress Measurements by X-Ray Diffraction, SAE Information Report J784a, Society of Automotive Engineers, Warrendale, PA (1971).
13. C. D. Wagner, W. M. Riggs, L. E. Davis, and J. F. Moulder, Handbook of X-Ray Photoelectron Spectroscopy, G. E. Muilenberg, Editor, p. 8, Perkin-Elmer Corp., Eden Prairie, MN (1979).
14. D. Ross and M. Maier, Fresenius Z. Anal. Chem., 333, 488 (1989).
15. H. Du, R. E. Tressler, and K. E. Spear, J. Electrochem. Soc., 136, 3210 (1989).
16. B. D. Cullity, Elements of X-Ray Diffraction, 2nd ed., p. 447, Addison-Wesley Publishing Company, Inc., Reading, MA (1978).