Tribochemical characterization of the lubrication film at the Si 3 N 4 /Si 3 N 4 interface sliding in aqueous solutions

Applied Surface Science

Volumn 92, Issue , 1996, Pages 651-655

  Honda, F ^a   Saito, T ^b  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

^b JTEKT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ANALYSIS; FRICTION; INTERFACES (MATERIALS); LUBRICATION; OXIDATION; PEROXIDES; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE; SODIUM CHLORIDE; SOLUTIONS; TRIBOLOGY;

COEFFICIENT OF FRICTION; ELECTRON PROBE MICROANALYSIS; FILM FORMATION; SLIDING; WEAR DEBRIS;

THIN FILMS;

EID: 0030562474     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00312-6     Document Type: Article

References (7)

1. For example, H. Tomizawa and T.E. Fischer, ASLE Trans. 30 (1987) 41.
2. S. Jahanmir and T.E. Fischer, STLE Trans. 31 (1988) 32.
3. S. Sasaki, Wear 134 (1989) 185.
4. To be published.
5. D. Dowson and G.R. Higginson, in: Elastohydrodynamic Lubrication (Pergamon, Oxford, 1977).
6. P. Anderson and P. Lintura, Trib. Int. 27 (1994) 315.
7. R.K. Her, in: The Chemistry of Silica (Wiley, New York, 1979) p. 30.