Electron field emission properties of gamma irradiated microcrystalline diamond and nanocrystalline carbon thin films

Journal of Applied Physics

Volumn 92, Issue 6, 2002, Pages 3311-3317

  Gupta, S ^a   Weiss, B L ^b   Weiner, B R ^a   Pilione, L ^c   Badzian, A ^c   Morell, G ^a  

^a UNIVERSITY OF PUERTO RICO   (Puerto Rico)

^b SONOMA STATE UNIVERSITY   (United States)

^c PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASSOCIATED ELECTRONICS; BUFFER MATERIALS; CARBON MATERIAL; ELECTRON FIELD EMISSION; ELECTRON FIELD EMISSION PROPERTIES; EMISSION CHARACTERISTICS; EMISSION PROPERTIES; INTERCONVERSIONS; MICRO-STRUCTURAL CHARACTERIZATION; MICROCRYSTALLINE DIAMOND; MICROSTRUCTURAL TRANSFORMATIONS; MICROWAVE PLASMA-ASSISTED CHEMICAL VAPOR DEPOSITION; NANOCRYSTALLINE CARBON; RADIATION-INDUCED; SENSITIVE MATERIALS; STRUCTURAL TRANSFORMATION; TURN-ON FIELD;

ATOMIC FORCE MICROSCOPY; CARBON; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; DEFECTS; DIAMOND FILMS; DOSIMETRY; FIELD EMISSION; GAMMA RAYS; IONIZING RADIATION; PHOTOELECTRONS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOCRYSTALLINE MATERIALS;

EID: 18644372217     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1499996     Document Type: Article

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