Diffractive lenses for photon energies ranging from the extreme ultraviolet to hard x-rays

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4499, Issue , 2001, Pages 85-95

  David, Christian ^a   Nöhammer, Bernd ^a   Solak, Harun ^a   Haas, Bianca ^a   Glaus, Fredy ^a   Van Der Veen, J Friso ^a   Schlott, Volker ^a   Bongaerts, Jeroen ^b   Kaulich, Burkhard ^c,d   Susini, Jean ^c  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b UNIVERSITY OF AMSTERDAM   (Netherlands)

^c EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^d SINCROTRONE TRIESTE   (Italy)

Author keywords

Electron beam lithography; EUV lithography; Microscopy; X ray fluorescence; Zone plate

Indexed keywords

DIFFRACTION; ELECTRON BEAM LITHOGRAPHY; FLUORESCENCE; LENSES; LIGHT TRANSMISSION; MIRRORS; PHOTONS; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION; X RAY MICROSCOPES;

BEAM MONITORING; EXTREME ULTRAVIOLET LITHOGRAPHY; FRESNEL PHASE ZONE PLATE; HARD X RAY; X RAY FLUORESCENCE;

X RAY OPTICS;

EID: 18644367535     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.450225     Document Type: Article

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