Mirror-based pattern generation for maskless lithography

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 42-47

  Oldham, William G ^a   Shroff, Yashesh ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Direct write; Maskless; MEMS; Optical lithography; Pattern generation

Indexed keywords

IMAGE ANALYSIS; INTEGRATED CIRCUITS; MICROELECTROMECHANICAL DEVICES; MIRRORS; PATTERN RECOGNITION; PHASE MODULATION; ULTRAVIOLET RADIATION;

DIRECT WIRE; MASKLESS; MASKLESS LITHOGRAPHY; PATTERN GENERATION;

PHOTOLITHOGRAPHY;

EID: 18544412958     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00070-X     Document Type: Conference Paper

References (7)

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2. U. Ljungbald, T. Sandstrom, H. Buhre, P. Durr, H. Lakner, SPIE, vol. 4186, 2001, pp. 16-21.
3. Chokshi N., Pickard D., McCord M., Pease F., Shroff Y., Chen Y., Oldham W., Markle D. J. Vac. Sci. Technol. B. (Nov.):1999;3047-3051.
4. Shroff Y., Chen Y., Oldham W. SPIE. 5037(Nov.):2003;550-559.
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7. Jorge Fryer of Micronic Inc. pointed out the image shift problem in a private communication.