Sigma7100, a new architecture for laser pattern generators for 130 nm and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4409, Issue 1, 2001, Pages 270-276

  SandstrÖm, TorbjÖrn ^a   Fillion, Tim ^a   Ljungblad, Uiric ^a   Rosling, Mats ^a  

^a Micronic Laser Systems AB   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; CMOS INTEGRATED CIRCUITS; EXCIMER LASERS; HEAT TRANSFER; INTEGRATED CIRCUIT MANUFACTURE; LASER APPLICATIONS; LASER PULSES; LIGHT MODULATORS; MASKS; MIRRORS; SYSTEMS ANALYSIS; THROUGHPUT;

LASER PATTERN GENERATORS; MASK SUBSTRATE; MICRONIC LASER SYSTEMS; SPATIAL LIGHT MODULATOR;

LITHOGRAPHY;

EID: 0035179932     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.438402     Document Type: Article

References (0)