Resolution extensions in the Sigma7000 imaging pattern generator

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 157-167

  Sandstrom, Tor ^a   Eriksson, Niklas ^a  

^a Micronic Laser Systems AB   (Sweden)

Author keywords

Lithography; LPC; Mask; Mask writer; OPC; Partially coherent image; PG; Proximity correction; Reticle writer; Scanner; Serifs; Stepper

Indexed keywords

CHARGE COUPLED DEVICES; CMOS INTEGRATED CIRCUITS; ELECTROSTATICS; EXCIMER LASERS; INTERFEROMETERS; LITHOGRAPHY; MASKS; MIRRORS;

PATTERN GENERATORS (PG);

LIGHT MODULATION;

EID: 0037966004     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.468623     Document Type: Conference Paper

References (5)

1. H. Kueck, M. Bollerott, W. Doleschal, A. Gehner, W. Grundke, D. Kunze, R. Melcher, J. Paufler, R. Seitmann, and G. Zimmer, "New system for fast submicron laser direct writing," Proc. SPIE, 2440, pp. 506-514,1995
2. U. Ljungblad, U. Dauderstädt, P. Dürr, T. Sandström, H. Buhre, and Hubert Lakner, "New laser pattern generator for DUV using a spatial light modulator," Microelectronic Engineering, 57-58, pp. 23-29, 2001
3. T. Sandstrom, T.I. Fillion, U.B. Ljungblad, and M. Rosling, "Sigma7100: a new architecture for laser pattern generators for 130 nm and beyond," Proc. SPIE, 4409, pp. 270-276, 2001
4. T. Sandstrom, P. Askebjer, J. Sallander, R. Zerne, and A. Karawajczyk, "Pattern generation with SLM imaging," Proc. SPIE 4562, pp. 38-44, 2002
5. J.Z. Luberek, A.M. Carroll, T. Sandstrom, and A. Karawajczyk, "Controlling CD variations in a massively parallel pattern generator," Proc. SPIE, 4691, pp. 671-678, 2002