Diamond CVD by microwave plasmas in argon-diluted methane without or with 2% hydrogen additive

Diamond and Related Materials

Volumn 14, Issue 3-7, 2005, Pages 261-265

  Tzeng, Y ^a   Liu, Y K ^a  

^a AUBURN UNIVERSITY   (United States)

Author keywords

Microcrystalline diamond; Microwave plasma; Nanodiamond; Secondary nucleation

Indexed keywords

ADDITIVES; ARGON; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; HYDROGEN; METHANE; MICROWAVES; NANOSTRUCTURED MATERIALS; NUCLEATION; PLASMA APPLICATIONS; SCANNING ELECTRON MICROSCOPY;

MICROCRYSTALLINE DIAMONDS (MCD); MICROWAVE PLASMA; NANODIAMONDS; SECONDERY NUCLEATION;

DIAMONDS;

EID: 18444415471     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2004.11.012     Document Type: Conference Paper

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