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Volumn 6, Issue 1, 2004, Pages 333-336

Comparison of the dielectric properties for doped and undoped TiO 2 thin films

Author keywords

Dielectric phenomena; Polycrystalline thin films; Semiconducting films; Titanium dioxide

Indexed keywords

CAPACITANCE; CAPACITORS; GLASS; MICROELECTRONICS; PERMITTIVITY; SEMICONDUCTOR DOPING; SPUTTERING; TITANIUM OXIDES; X RAY DIFFRACTION ANALYSIS;

DIELECTRIC PHENOMENA; POLYCRYSTALLINE THIN FILMS;

THIN FILMS;

EID: 1842866289 PISSN: 14544164 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (74)

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