|
Volumn 48, Issue 7, 2004, Pages 1169-1174
|
Design considerations for novel device architecture: Hetero-material double-gate (HEM-DG) MOSFET with sub-100 nm gate length
|
Author keywords
Characterization; DG MOSFET; DIBL; Hetero material gate
|
Indexed keywords
APPROXIMATION THEORY;
COMPUTER SIMULATION;
DIELECTRIC DEVICES;
DIFFERENTIAL EQUATIONS;
ELECTRIC FIELDS;
GATES (TRANSISTOR);
MATHEMATICAL MODELS;
OPTIMIZATION;
PERTURBATION TECHNIQUES;
POISSON EQUATION;
SEMICONDUCTOR DOPING;
SEMICONDUCTOR JUNCTIONS;
THRESHOLD VOLTAGE;
DG-MOSFET;
DRAIN INDUCED BARRIER LOWERING (DIBL);
HETERO-MATERIAL GATE;
MOSFET DEVICES;
|
EID: 1842865585
PISSN: 00381101
EISSN: None
Source Type: Journal
DOI: 10.1016/j.sse.2003.12.009 Document Type: Article |
Times cited : (39)
|
References (11)
|