Influence of sputtering target material on crystallinity and orientation of AlN thin films

Journal of the Ceramic Society of Japan

Volumn 110, Issue 1278, 2002, Pages 115-117

  Akiyama, Morito ^a   Xu, Chao Nan ^a   Hagio, Tsuyoshi ^a   Nonaka, Kazuhiro ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Aluminum nitride; c axis orientation; Crystallinity; Oxygen; Sputtering target; Thin films

Indexed keywords

ALUMINUM NITRIDE; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; OXYGEN; SINTERING; SPUTTERING; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

C-AXIS ORIENTATION; CRYSTALLINITY; SPUTTERING TARGET;

THIN FILMS;

EID: 0038066173     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.110.115     Document Type: Article

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