Phase characterisation of TiO2 thin films using micro-raman spectroscopy and glancing angle x-ray diffraction

Conference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD

Volumn 2002-January, Issue , 2002, Pages 181-184

  Hugman, J ^a   Richards, B S ^a   Crosky, A ^a  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHARACTERIZATION; MICROELECTRONICS; OXIDE MINERALS; RAMAN SPECTROSCOPY; REFRACTIVE INDEX; SILICON SOLAR CELLS; THIN FILMS; TITANIUM DIOXIDE;

ANNEALING TEMPERATURES; GLANCING ANGLE X-RAY DIFFRACTIONS; MICRO RAMAN SPECTROSCOPY; OPTIMUM VALUE; PHASE FRACTIONS; QUANTITATIVE RESULT; RUTILE PHASE; SILICON SUBSTRATES;

X RAY DIFFRACTION;

EID: 84952651065     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/COMMAD.2002.1237222     Document Type: Conference Paper

References (8)

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3. B. S. Richards, Solar Energy Materials and Solar Cells (submitted September 2002).
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8. D. Mardare, J. Materials Science and Engineering, B95, 83-87 (2002).