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Journal of Applied Physics

Volumn 79, Issue 6, 1996, Pages 2934-2941

Argon incorporation and silicon carbide formation during low energy argon-ion bombardment of Si(100)

(5) Pan, J S a Wee, A T S a Huan, C H A a Tan, H S a Tan, K L a

a NATIONAL UNIVERSITY OF SINGAPORE (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000983807 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.361289 Document Type: Article

Times cited : (43)

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