Flows for model-based layout correction of mask proximity effects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 2, 2003, Pages 956-964

  Cobb, Nick ^a   Maurer, Wilhelm ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Mask making; Models; MPC; OPC

Indexed keywords

CALIBRATION; COMPUTER SIMULATION; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; PROBLEM SOLVING; SILICON WAFERS;

OPTICAL PROXIMITY CORRECTION (OPC);

MASKS;

EID: 1842422471     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518477     Document Type: Conference Paper

References (11)

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