Theoretical corner rounding analysis and mask writer simulation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 II, Issue , 2003, Pages 1035-1043

  Jones, Robert ^a   Byers, Jeffrey ^a  

^a KLA Tencor Austin   (United States)

Author keywords

Corner rounding; Lithography modeling; Mask writer; Microlithography; PROLITH; Simulation

Indexed keywords

COMPUTER SIMULATION; FEATURE EXTRACTION; FOURIER OPTICS; IMAGING SYSTEMS; MASKS; MATHEMATICAL MODELS; SILICON WAFERS;

GAUSSIAN LASER WRITERS; LITHOGRAPHIC IMAGING; MASK WRITER;

PHOTOLITHOGRAPHY;

EID: 0141498455     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485538     Document Type: Conference Paper

References (5)

1. Mack, Chris A., "Corner rounding and line-end shortening in optical lithography," Proc. SPIE 4226, 83-92 (2000).
2. Mack, Chris A., Sauer, Charles A., Weaver, Suzanne, and Chabala, Jan M., "Lithography performance of contact holes: II. Simulation of the effects of reticle corner rounding on wafer print performance," Proc. SPIE 4066, 172-9 (2000).
3. Adam, Konstantinos, Socha, Robert J., Pistor, Tom, and Neureuther, Andrew R., "Simulating photomask edge roughness and corner rounding," Proc. SPIE 3050, 215-23 (1997).
4. Kim, Hee-Bom, Ma, Won-Kwang, Ahn, Chang-Nam, and Shin, Ki-Soo, "Optical lithography simulation considering impact of mask errors," Proc. SPIE 4691, 1278-86 (2002).
5. Howard, William B., Wiaux, Vincent, Ercken, Monique, Bui, Bang, Byers, Jeff D., and Pochkowski, Mike, "Tuning and simulating a 193-nm resist for 2D applications," Proc. SPIE 4691, 1190-8 (2002).