Adjustment of optical proximity correction (OPC) software for mask process correction (MPC). Module 1: Optical mask writing tool simulation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 II, Issue , 2001, Pages 511-521

  Barberet, A ^a   Fanget, G ^b   Buck, P ^c   Toublan, O ^d   Richoilley, J C ^a   Tissier, M ^a  

^a DUPONT COMPANY   (United States)

^b CEA LETI   (France)

^c DuPont Photomasks Inc   (United States)

^d MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

193 nm lithography; Mask manufacturing; Mask Process Correction; Mask process simulation

Indexed keywords

COMPUTER SOFTWARE; DATABASE SYSTEMS; DRY ETCHING; INTEGRATED CIRCUIT MANUFACTURE; LASER APPLICATIONS; LITHOGRAPHY;

OPTICAL PROXIMITY CORRECTIONS (OPC);

MASKS;

EID: 0035767880     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.458328     Document Type: Article

References (0)