Effect of plasma parameters on the structure of CNx layers deposited by DC magnetron sputtering

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 1200-1204

  Ujvari T ^a   Szikora, B ^b   Mohai, M ^a   Toth A ^a   Keresztury, G ^a   Bertoti I ^a  

^a CHEMICAL RESEARCH CENTER   (Hungary)

^b BUDAPEST UNIVERSITY OF TECHNOLOGY AND ECONOMICS   (Hungary)

Author keywords

C3N4; Magnetron sputtering; Nitrides; XPS

Indexed keywords

CARBON NITRIDE; CHEMICAL BONDS; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAPHITE; MAGNETRON SPUTTERING; NITROGEN; PLASMAS; SILICON WAFERS; X RAY PHOTOELECTRON SPECTROSCOPY;

ASYMMETRIC SHAPE;

THIN FILMS;

CARBON NITRIDE; FILM;

EID: 0036508293     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00687-2     Document Type: Article

References (19)