Form-birefringence structure fabrication in GaAs by use of SU-8 as a dry-etching mask

Applied Optics

Volumn 44, Issue 12, 2005, Pages 2377-2381

  Pang, Lin ^a   Nezhad, Maziar ^a   Levy, Uriel ^a   Tsai, Chia Ho ^a   Fainman, Yeshaiahu ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIREFRINGENCE; DIFFRACTION GRATINGS; DRY ETCHING; LITHOGRAPHY; MASKS; MICROELECTRONICS; MICROMETERS; OPTICAL BEAM SPLITTERS; OPTICAL SYSTEMS; SCANNING ELECTRON MICROSCOPY;

BEAM SPLITTERS; HOLOGRAPHIC LITHOGRAPHY; POSTEXPOSURE BAKE (PEB); SU-8 SUBMICROMETERS;

SEMICONDUCTING GALLIUM ARSENIDE;

EID: 17644388101     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.44.002377     Document Type: Article

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