Enhanced i-line lithography using AZ BARLi coating

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 724-737

  Yang, T S ^a   Kook, Taeho H ^a   Taylor, J A ^a   Josephson, W A ^a   Spak, Mark A ^a   Dammel, Ralph R ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DENSIFICATION; THERMAL STABILITY;

COATINGS; ETCHING; HIGH TEMPERATURE PROPERTIES; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE; STABILITY;

LITHOGRAPHY;

EID: 0029774846     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)