Modeling of a nanoscale oxide aperture opening for a NSOM probe

Journal of the Korean Physical Society

Volumn 45, Issue 6, 2004, Pages 1659-1663

  Choi, S S ^a   Ok, J T ^a   Kim, D W ^a   Jung, M Y ^a   Park, M J ^b  

^a SunMoon University   (South Korea)

^b Korea Military Academy   (South Korea)

Author keywords

Anisotropic Si etching; Electron beam enhanced etch rate; Isotropic oxide etching; Near field probe; Time dependent oxide etch rate

Indexed keywords

EID: 17544384134     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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