Precise lattice parameter comparison of highly perfect silicon crystals

Journal of Physics D: Applied Physics

Volumn 38, Issue 10 A, 2005, Pages

  Hanke, M ^a,b   Kessler, E G ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; DATA REDUCTION; ETCHING; INTERFEROMETERS; SILICON; X RAY DIFFRACTION; X RAYS;

ATOMIC MASSES; AVOGADRO CONSTANT; FULL WIDTH AT HIGH MAXIMUM (FWHM); SILICON CRYSTALS;

LATTICE CONSTANTS;

EID: 17444425044     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/38/10A/022     Document Type: Article

References (13)

1. Basile G, Bergamin A, Cavagnero C, Mana G, Vittone E and Zosi G 1994 Phys. Rev. Lett. 72 3133
2. Becker P, Bettin H, Danzebrink H-U, Gläser M, Kuetgens U, Nicolaus A, Schiel D, De Bièvre P, Valkiers S and Taylor P 2003 Metrologia 40 271
3. Cavagnero G, Fujimoto H, Mana G, Massa E, Nakayama K and Zosi G 2004 Metrologia 41 56
4. Hart M 1969 Proc. R. Soc. A 309 281-96
5. Kessler E G, Henins A, Deslattes R D, Nielsen L and Arif M 1994 J. Res. Natl Inst. Stand. Technol. 99 1
6. Kessler E, Owens S, Henins A and Deslattes R 1999 IEEE Trans. Instrum. Meas. 48 221
7. Martin J, Kuetgens U, Stümpel J and Becker P 1998 Metrologia 35 811
8. Nakayama K and Fujimoto H 1997 IEEE Trans. Instrum. Meas. 46 580
9. Nakayama K, Fujimoto H, Ishikawa T and Takeno H 2001 IEEE Trans. Instrum. Meas. 50 601
10. Taylor B 1994 Metrologia 31 181
11. Walker G 2004 Science 304 812
12. Windisch D and Becker P 1990 Phys. Status Solidi a 118 379-88
13. Williams E R, Steiner R L, Newell D B and Olsen P T 1998 Phys. Rev. Lett. 81 2404