Growth of ferromagnetic semiconductor Ge1-x Mnx Te films on Ba F2 (111) by ionized cluster beam deposition

Journal of Applied Physics

Volumn 97, Issue 7, 2005, Pages

  Fukuma, Y ^a   Arifuku, M ^b   Asada, H ^b   Koyanagi, T ^b  

^a Yamaguchi Prefectural Industrial Technology Institute   (Japan)

^b YAMAGUCHI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CURIE TEMPERATURE; FERROMAGNETIC SEMICONDUCTORS; IONIZED CLUSTER BEAM DEPOSITION; SPINTRONIC DEVICES;

BARIUM COMPOUNDS; EPITAXIAL GROWTH; FERROMAGNETIC MATERIALS; FERROMAGNETISM; HALL EFFECT; ION BEAM ASSISTED DEPOSITION; MAGNETIZATION; SUBSTRATES; TEMPERATURE DISTRIBUTION; THIN FILMS;

GERMANIUM COMPOUNDS;

EID: 17444391257     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1865341     Document Type: Article

References (34)

1. G. A. Prinz, Science 282, 1660 (1998).
2. S. A. Wolf, D. D. Awschalom, R. A. Buhrman, J. M. Daughton, S. von Molnár, M. L. Roukes, A. Y. Chtchelkanova, and D. M. Treger, Science 294, 1488 (2001).
3. D. D. Awschalom and R. K. Kawakami, Nature (London) 408, 923 (2000).
4. H. Ohno, J. Magn. Magn. Mater. 200, 110 (1999).
5. H. Ohno, Science 281, 951 (1998).
6. H. Ohno, F. Matsukura, and Y. Ohno, Solid State Commun. 119, 281 (2001).
7. S. Koshihara, A. Oiwa, M. Hirasawa, S. Katsumoto, Y. Iye, C. Urano, H. Takagi, and H. Munekata, Phys. Rev. Lett. 78, 4617 (1997).
8. R. Fiederling, M. Keim, G. Reuscher, W. Ossau, G. Schmidt, A. Waag, and L. W. Molenkamp, Nature (London) 402, 787 (1999).
9. Y. Ohno, D. K. Young, B. Beschoten, F. Matsukura, H. Ohno, and D. D. Awschalom, Nature (London) 402, 790 (1999).
10. H. Ohno, D. Chiba, F. Matsukura, T. Omiya, E. Abe, T. Dietl, Y. Ohno, and K. Ohtani, Nature (London) 408, 944 (2000).
11. G. Schmidt, G. Richter, P. Grabs, C. Gould, D. Ferrand, and L. W. Molenkamp, Phys. Rev. Lett. 87, 227203 (2001).
12. M. Tanaka and Y. Higo, Phys. Rev. Lett. 87, 026602 (2001).
13. T. Story, G. Karczewski, L. Świerkowski, and R. R. Gała̧zka, Phys. Rev. B 42, 10477 (1990).
14. R. W. Cochrane, M. Plischke, and J. O. Ström-Olsen, Phys. Rev. B 9, 3013 (1974).
15. Y. Fukuma, H. Asada, N. Nishimura, and T. Koyanagi, J. Appl. Phys. 93, 4034 (2003).
16. G. Springholz, Z. Shi, and H. Zogg, in Thin Films: Heteroepitaxial Systems, edited by, W. K. Liu, and, M. B. Santos, (World Scientific, Singapore, 1998), p. 621.
17. Y. Fukuma, T. Murakami, H. Asada, and T. Koyanagi, Physica E (Amsterdam) 10, 273 (2001).
18. T. Takagi, I. Yamada, M. Kunori, and S. Kobiyama, in Proceedings of the Second International Conference on Ion Sources (Osterreichiche Studiengesellshaft fur Atomenenergie, Vienna, 1972), p. 790.
19. T. Takagi, I. Yamada, and K. Matsubara, Thin Solid Films 58, 9 (1979).
20. T. Takagi, J. Vac. Sci. Technol. A 2, 382 (1984).
21. I. Yamada, H. Takaoka, H. Usui, and T. Takagi, J. Vac. Sci. Technol. A 4, 722 (1986).
22. J. Takada, Jpn. J. Appl. Phys., Part 1 34, 3864 (1995).
23. Y. Fukuma, H. Asada, M. Arifuku, and T. Koyanagi, Appl. Phys. Lett. 80, 1013 (2002).
24. T. Koyanagi, K. Matsubara, H. Takaoka, and T. Takagi, J. Appl. Phys. 61, 3020 (1987).
25. A. V. Novoselova and V. P. Lomanow, in Current Topics in Material Science, edited by, E. Kaldis, (North-Holland, Amsterdam, 1981), Vol. 7, p. 643.
26. D. A. Northrop, J. Chem. Phys. 75, 118 (1971).
27. R. Colin and J. Drowart, J. Chem. Phys. 37, 1120 (1962).
28. J. V. D. Boomgaard, Philips Res. Rep. 24, 284 (1969).
29. H. Clemens, E. J. Fantner, W. Ruhs, and G. Bauer, J. Cryst. Growth 66, 251 (1984).
30. J. C. Snyman, G. Gouws, and R. J. Muller, J. Cryst. Growth 70, 373 (1984).
31. P. Müller, A. Fach, J. John, A. N. Tiwari, H. Zogg, and G. Kostorz, J. Appl. Phys. 79, 1911 (1996).
32. H. Zogg, Phys. Rev. B 50, 10801 (1994).
33. Y. Fukuma, M. Arifuku, H. Asada, and T. Koyanagi, J. Appl. Phys. 91, 7502 (2002).
34. C. M. Hurd, The Hall Effect and Its Application, edited by, C. L. Chien, and, C. R. Westgate, (Plenum, New York, 1980), p. 43.