Spectroscopic optical metrology for process characterization and control

Microlithography World

Volumn 11, Issue 1, 2002, Pages 12-16+24

  Allgair, John ^a   Herrera, Pedro ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; LIGHT POLARIZATION; LIGHT REFLECTION; LIGHT SCATTERING; PHOTOLITHOGRAPHY; PHOTORESISTS; PROCESS CONTROL; SHRINKAGE; SPECTROSCOPIC ANALYSIS; SUBSTRATES; THIN FILMS; WSI CIRCUITS;

ANGLE-DEPENDENT SCATTEROMETRY (ADS); CRITICAL DIMENSION (CD) MEASUREMENTS;

OPTICAL VARIABLES MEASUREMENT;

EID: 0036478069     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Review

References (12)

1. Scatterometry applied to microelectronics processing
2. Scatterometry for 0.24-0.70μm developed photoresist metrology
3. Scatterometry measurements for process monitoring of potysilicon gate etch
4. Scatterometry for post-etch polysilicon gate metrology
5. Specular spectroscopic scatterometry in DUV lithography
6. Rigorous coupled-wave analysis of planargrating Diffraction
7. Diffraction analysis of dielectric surface-relief gratings
8. Analysis and applications of optical diffraction by gratings
9. A modal analysis of lammellar diffraction gratings in conical mountings
10. Multilayer modal method for diffraction gratings of arbitary profile, depth, and permittivity
11. Addendum
12. Convergence of the coupled-wave method for metallic lamellar diffraction gratings