In situ and real-time characterization of metal-organic chemical vapor deposition growth by high resolution x-ray diffraction

Review of Scientific Instruments

Volumn 76, Issue 3, 2005, Pages

  Kharchenko, A ^a,c   Lischka, K ^a   Schmidegg, K ^b   Sitter, H ^b   Bethke, J ^c   Woitok, J ^c  

^a UNIVERSITY OF PADERBORN   (Germany)

^b JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^c MALVERN INSTRUMENTS LTD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

BRAGG REFLECTIONS; EPITAXIAL LAYERS; LAYER STACKS; SEMICONDUCTOR LAYERS;

GALLIUM NITRIDE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MONOCHROMATORS; SURFACE PROPERTIES; X RAY DIFFRACTION ANALYSIS; X RAYS;

EPITAXIAL GROWTH;

EID: 17044414823     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1857277     Document Type: Article

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