Silica and alumina thin films grown by liquid phase deposition

Materials Science Forum

Volumn 475-479, Issue III, 2005, Pages 1725-1728

  Sun, Jie ^a,b   Hu, Lizhong ^a   Wang, Zhaoyang ^a   Du, Guotong ^a,c  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b INSTITUTE OF SEMICONDUCTORS   (China)

^c JILIN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANNEALING; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; FABRICATION; MICROELECTRONICS; OXIDES; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR MATERIALS; THIN FILMS;

CHEMICAL STABILITY; DENSE STRUCTURES; LIQUID PHASE DEPOSITION; SILICA FILMS;

SILICA;

EID: 17044375909     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-960-1.1725     Document Type: Conference Paper

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