Silicon dioxide passivation of gallium arsenide by liquid phase deposition

Materials Chemistry and Physics

Volumn 70, Issue 1, 2001, Pages 78-83

  Huang, C J ^a   Chen, Jiann Ruey ^b   Huang, S P ^c  

^a FORTUNE INSTITUTE OF TECHNOLOGY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^c NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FILM GROWTH; LEAKAGE CURRENTS; PASSIVATION; REFRACTIVE INDEX; SEMICONDUCTING GALLIUM ARSENIDE;

LIQUID PHASE DEPOSITION;

SILICA;

EID: 0034836118     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(00)00463-6     Document Type: Article

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