Electrical characteristics and lifetimes of microdischarge devices having thin dielectric films of aluminum oxide, boron nitride, or barium titanate

Electronics Letters

Volumn 39, Issue 10, 2003, Pages 773-775

  Park, S J ^a   Eden, J G ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; BARIUM TITANATE; BORON COMPOUNDS; DEPOSITION; DIELECTRIC FILMS; ELECTRIC PROPERTIES; SERVICE LIFE; SOL-GELS; THIN FILMS;

ALUMINUM OXIDE; BORON NITRIDE; MICRODISCHARGE DEVICES; THIN DIELECTRIC FILMS;

MICROELECTROMECHANICAL DEVICES;

EID: 0037672990     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20030430     Document Type: Article

References (4)

1. Park, S.-J., et al.: 'Microdischarge arrays: a new family of photonic devices', IEEE J. Sel. Top. Quantum Electron., 2002, 8, pp. 139-147
2. Sankaran, R.M., and Giapis, K.P.: 'Maskless etching of silicon using patterned microdischarges', Appl. Phys. Lett., 2001, 79, pp. 593-595
3. Park, S.-J., et al.: 'Arrays of silicon microdischarge devices with multicomponent dielectrics', Opt. Lett., 2001, 26, pp. 1773-1775
4. Vojak, B.A., et al.: 'Multistage, monolithic ceramic microdischarge device having an active length of ̃0.27 mm', Appl. Phys. Lett., 2001, 78, pp. 1340-1342