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Volumn 729, Issue , 2002, Pages 47-56

Lift-off methods for MEMS devices

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; FLUOROCARBONS; MIXTURES; OXYGEN; PHOTORESISTS; PLASMA ETCHING; THERMAL EFFECTS; THICKNESS MEASUREMENT;

EID: 0036929053     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-729-u2.3     Document Type: Article
Times cited : (2)

References (9)
  • 1
    • 0012329782 scopus 로고
    • VLSI technology
    • Ed. S. M. Sze, Chapter 9, McGraw-Hill
    • "VLSI Technology," Ed. S. M. Sze, Chapter 9, McGraw-Hill, (1983).
    • (1983)
  • 2
    • 0018296726 scopus 로고
    • Lift-off metallization of sputtered Al alloy films
    • T. Sakurai and T. Serikawa, "Lift-Off Metallization of Sputtered Al Alloy Films," J. Electrochem. Soc., 126,1257 (1979).
    • (1979) J. Electrochem. Soc. , vol.126 , pp. 1257
    • Sakurai, T.1    Serikawa, T.2
  • 3
    • 0012270412 scopus 로고
    • A simple metal lift-off process
    • T. Batchelder, "A Simple Metal Lift-Off Process," Solid State TechNet., 25, 11 (1982).
    • (1982) Solid State TechNet. , vol.25 , pp. 11
    • Batchelder, T.1
  • 4
    • 0019035283 scopus 로고
    • Single-step optical lift-off process
    • M. Hatzakis, B. J. Canavello, J. M. Shaw, J., "Single-Step Optical Lift-Off Process," IBM Res. & Dev., Vol. 24, no. 4, p. 452, July (1980).
    • (1980) IBM Res. & Dev. , vol.24 , Issue.4 , pp. 452
    • Hatzakis, M.1    Canavello, B.J.2    Shaw, J.M.3
  • 5
    • 0018545401 scopus 로고
    • High resolution, steep profile resist patterns
    • J. M. Moran and D. Maydan, "High Resolution, Steep Profile Resist Patterns," J. Vac. Sci. Technol., 16(60), p. 1620, (1979).
    • (1979) J. Vac. Sci. Technol. , vol.16 , Issue.60 , pp. 1620
    • Moran, J.M.1    Maydan, D.2
  • 6
    • 0012273759 scopus 로고
    • Optical imaging for microfabrication
    • J. H. Bruning, "Optical Imaging for Microfabrication," J. Vac. Sci. Technol. 23(2), p. 1147, (1980).
    • (1980) J. Vac. Sci. Technol. , vol.23 , Issue.2 , pp. 1147
    • Bruning, J.H.1
  • 9
    • 0038798179 scopus 로고
    • Micromachining application of high resolution ultrathick photoresist
    • K. Y. LEE, et al., "Micromachining Application of High Resolution Ultrathick Photoresist," J. Vac. Technol., B 13(6), p. 3012, (1995)
    • (1995) J. Vac. Technol., B , vol.13 , Issue.6 , pp. 3012
    • Lee, K.Y.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.