XPS studies on damage evaluation of single-crystal diamond chips processed with ion beam etching and reactive ion beam assisted chemical etching

Diamond and Related Materials

Volumn 13, Issue 1, 2004, Pages 93-98

  Kawabata, Yusaku ^a   Taniguchi, Jun ^a   Miyamoto, Iwao ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Diamond; Ion beam assist chemical etching; Ion bombardment damage; X Ray photoelectron spectroscopy (XPS)

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; CRYSTAL STRUCTURE; DIAMONDS; ION BEAMS; OXYGEN; REACTIVE ION ETCHING; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL ETCHING; ION BEAM DAMAGE;

SINGLE CRYSTALS;

DAMAGE ASSESSMENT; DIAMOND;

EID: 1642481292     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2003.09.005     Document Type: Article

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