Effects of Br and Cl on organometallic vapor phase epitaxial growth and ordering in GaInP

Journal of Applied Physics

Volumn 95, Issue 5, 2004, Pages 2319-2323

  Howard, A D ^a   Rieth, L W ^a   Chapman, D C ^a   Wixom, R R ^a   Stringfellow, G B ^a   Kim, B J ^b   Seong, T Y ^b  

^a UNIVERSITY OF UTAH   (United States)

^b Gwangju Institute of Science and Technology (GIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BAND GAPS; DISTRIBUTION COEFFICIENT;

ATOMIC FORCE MICROSCOPY; BROMINE; CHLORINE; CRYSTAL GROWTH; ELECTRON DIFFRACTION; GALLIUM ALLOYS; HETEROJUNCTIONS; MICROSTRUCTURE; MORPHOLOGY; PHOTOLUMINESCENCE; REDUCTION; SURFACE ACTIVE AGENTS; SURFACE ROUGHNESS;

METALLORGANIC VAPOR PHASE EPITAXY;

EID: 1642346982     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1643783     Document Type: Article

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