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Volumn 22, Issue 1, 2004, Pages 126-130

Improvement of resolution in x-ray lithography by reducing secondary electron blur

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE; COMPUTER SIMULATION; ELECTRON SCATTERING; ELECTRONS; MONTE CARLO METHODS; ORGANIC POLYMERS; SILICON; SIMULATORS; SYNCHROTRON RADIATION;

EID: 1642291429     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1635847     Document Type: Conference Paper
Times cited : (6)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.