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Volumn 22, Issue 1, 2004, Pages 126-130
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Improvement of resolution in x-ray lithography by reducing secondary electron blur
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Author keywords
[No Author keywords available]
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Indexed keywords
CHLORINE;
COMPUTER SIMULATION;
ELECTRON SCATTERING;
ELECTRONS;
MONTE CARLO METHODS;
ORGANIC POLYMERS;
SILICON;
SIMULATORS;
SYNCHROTRON RADIATION;
ENERGY DEPOSITION;
RESISTS;
SECONDARY ELECTRON BLUR;
X RAY LITHOGRAPHY;
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EID: 1642291429
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1635847 Document Type: Conference Paper |
Times cited : (6)
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References (13)
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