Effect of secondary electron from the substrate in x-ray lithography using harder radiation spectra

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2439-2443

  Itoga, K ^a   Marumoto, K ^a   Kitayama, T ^a   Sumitani, H ^b   Amemiya, M ^c   Watanabe, Y ^c  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

^b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^c CANON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DEGRADATION; ELECTRONS; MONTE CARLO METHODS; RADIATION EFFECTS; SUBSTRATES;

HARDER RADIATION SPECTRA; SECONDARY ELECTRON;

X RAY LITHOGRAPHY;

EID: 0035519138     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1420534     Document Type: Article

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