Suppression of secondary electron blur by using Br-containing resists in x-ray lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2953-2957

  Kise, K ^a   Marumoto, K ^a   Watanabe, H ^a   Itoga, K ^a   Kumada, T ^a   Sumitani, H ^a   Kitayama, T ^a   Amemiya, M ^b   Watanabe, Y ^b   Uda, K ^b  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

^b CANON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BROMINE; CALCULATIONS; COMPOSITION EFFECTS; COMPUTER SIMULATION; DEGRADATION; MONTE CARLO METHODS; PHOTORESISTS; X RAY LITHOGRAPHY;

LITHOGRAPHIC SIMULATOR; SECOND GENERATION PROXIMITY X RAY LITHOGRAPHY; SECONDARY ELECTRON;

ELECTRON SCATTERING;

EID: 0036883193     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1520565     Document Type: Article

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