Polyatomicity and kinetic energy effects on surface polymerization by ion-assisted deposition

International Journal of Mass Spectrometry

Volumn 241, Issue 2-3 SPEC.ISS., 2005, Pages 139-147

  Choi, Yongsoo ^a   Zachary, Adam ^a   Tepavcevic, Sanja ^a   Wu, Chunping ^a   Hanley, Luke ^a  

^a UNIVERSITY OF ILLINOIS AT CHICAGO   (United States)

Author keywords

Desorption ionization on oxidized silicon; Ion deposition; Ion assisted deposition; Polythiophene; Surface polymerization

Indexed keywords

ARGON; ION; SILICONE; SULFUR DERIVATIVE; THIOPHENE; THIOPHENE DERIVATIVE;

ARTICLE; CATALYST; CHEMICAL COMPOSITION; CHEMISTRY; COMPARATIVE STUDY; CRYSTAL; DESORPTION; ENERGY; EVAPORATION; FILM; FRAGMENTATION REACTION; INFRARED SPECTROSCOPY; IONIZATION; KINETICS; MASS SPECTROMETRY; MEASUREMENT; MOLECULAR WEIGHT; OXIDATION; PHOTOLUMINESCENCE; POLYMERIZATION; STRUCTURE ANALYSIS; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION;

EID: 15944375452     PISSN: 13873806     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijms.2004.12.022     Document Type: Article

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