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Volumn 244, Issue 1-4, 2005, Pages 21-25
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Influence of thickness of Hf buffer layer on the interfacial structures of sputtered HfO 2 on SiO 2 /Si
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Author keywords
Annealing; HfO 2; Sputtering deposition; XPS
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Indexed keywords
ANNEALING;
HAFNIUM COMPOUNDS;
SILICON COMPOUNDS;
SPUTTERING;
SURFACE REACTIONS;
THIN FILMS;
X RAY PHOTOELECTRON SPECTROSCOPY;
HFO2;
INTERFACIAL DIFFUSION;
SPUTTERING DEPOSITION;
X-RAY REFLECTIVITY;
SURFACE CHEMISTRY;
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EID: 15844379190
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2004.10.061 Document Type: Conference Paper |
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Times cited : (5)
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References (12)
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