Spectroscopic investigations on silicon nitride deposition with the Plasmodul®

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 947-951

  Schulz, A ^a   Feichtinger, J ^a   Kruger J ^a   Walker, M ^a   Schumacher, U ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

Author keywords

Mass spectrometry; Plasma reactor; Silicon nitride

Indexed keywords

DEPOSITION; MONOMERS; SPECTROSCOPIC ANALYSIS;

PLASMA COMPOUNDS;

SILICON NITRIDE;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0042829167     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00535-8     Document Type: Article

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