Nitriding of titanium by NH3 RF plasma: A study of the corrosion resistance and the mechanical properties of the protective films formed at the solid surface

Materials Research Bulletin

Volumn 37, Issue 15, 2002, Pages 2539-2546

  Bellakhal, Nizar ^a,b  

^a UNIVERSITY OF CARTHAGE   (Tunisia)

^b UFR des Sciences et des Techniques   (France)

Author keywords

A. Metal; A. Thin films; C. Electrochemical measurements; C. X ray diffraction

Indexed keywords

CORROSION RESISTANCE; ELECTROCHEMISTRY; NITRIDING; PLASMAS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

SOLID SURFACES;

TITANIUM COMPOUNDS;

EID: 0036896114     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0025-5408(01)00709-7     Document Type: Article

References (16)

1. Rapakoulias D., Gerassimou D.E. J. Appl. Phys. 62:1987;402.
2. Bellakhal N., Draou K., Chéron B.G., Brisset J.L. Mater. Sci. Eng. B. 41:1996;206.
3. Bellakhal N., Draou K., Brisset J.L. J. Appl. Electrochem. 27:1997;414.
4. Draou K., Bellakhal N., Chéron B.G., Brisset J.L. Mater. Res. Bull. 33(7):1998;1117.
5. Favia P., Palumbo F., Stendardo M.V., d'Agostino R. Plasmas Polym. 1(2):1996;91.
6. Kaufman F. J. Chem. Phys. 85:1981;2163.
7. d'Agostino R., Cramarossa F., De Benedictis S., Ferraro G. Plasma Chem. Plasma Proc. 1:1981;19.
8. A. Gicquel, N. Laidani, M. Morin, J. Amouroux, in: Proceedings of the 7th International Symposium on Plasma Chemistry, Vol. 2, Eindhoven, The Netherlands, 1985, p. 418.
9. Beneke R., Sandenbergh R.F. Corr. Sci. 29:1989;543.
10. Rozenak P. J. Mater. Sci. 25:1990;2532.
11. Oldfield J.W. Corrosion. 46:1990;574.
12. Leitào E. Corr. Sci. 29:1997;333.
13. Brisset J.L., Doubla A., Lelièvre J., Amouroux J. Analusis. 26:1990;185.
14. Fix R., Gordon R.G., Hoffman D.M. Chem. Mater. 3:1991;1138.
15. Huang C.C., Tsai W.T., Lee J.T. J. Electrochem. Soc. 142:1995;1221.
16. Chou S.L., Tsai M.J., Tsai W.T., Lee J.T. Mater. Chem. Phys. 51:1997;97.