[(1,5-Cyclooctadiene)(toluene)ruthenium(o)]: A novel precursor for the MOCVD of thin ruthenium films

Chemical Vapor Deposition

Volumn 11, Issue 2, 2005, Pages 99-105

  Schneider, Andreas ^a   Popovska, Nadja ^a   Holzmann, Frank ^a   Gerhard, Helmut ^a   Topf, Christian ^a   Zenneck, Ulrich ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

C H activation; Gas chromatography; Moderate temperature MOCVD; Ruthenium films

Indexed keywords

ACTIVATION ANALYSIS; CONTAMINATION; DEGRADATION; ENERGY DISPERSIVE SPECTROSCOPY; EXHAUST GASES; GAS CHROMATOGRAPHY; INDUCTIVELY COUPLED PLASMA; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; RUTHENIUM; SHORT CIRCUIT CURRENTS;

C-H ACTIVATION; ELASTIC RECOIL DETECTION ANALYSIS (ERDA); MODERATE TEMPERATURE MOCVD; RUTHENIUM FILMS;

THIN FILMS;

EID: 15544385901     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200406315     Document Type: Article

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