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Journal of Alloys and Compounds

Volumn 392, Issue 1-2, 2005, Pages 231-236

Structural and electrical characteristics of highly textured oxidation-free Ru thin films by DC magnetron sputtering

(5) Tian, Hu Yong a,b Wang, Yu a Chan, Helen Lai Wa a Choy, Chung Loong a No, Kwang Soo b

a HONG KONG POLYTECHNIC UNIVERSITY (Hong Kong)

b Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

Author keywords

DC sputtering; Resistivity; Textured Ru films

Indexed keywords

CAPACITORS; CRYSTALLIZATION; DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC CONDUCTIVITY; ELECTRODES; MAGNETRON SPUTTERING; OXIDATION; ROLLING; RUTHENIUM; SILICON; SUPERCONDUCTING TAPES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

DC SPUTTERING; STRAIN ENERGY; TEMPERATURE COEFFICIENT OF RESISTANCE (TCR); TEXTURED RU FILMS;

TEXTURING;

EID: 15544368940 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2004.09.041 Document Type: Article

Times cited : (2)

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