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Volumn 479, Issue 1-2, 2005, Pages 52-58
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Helium-charged titanium films deposited by direct current magnetron sputtering
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Author keywords
Helium incorporation; Sputtering; Titanium; Transmission electron microscopy
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Indexed keywords
BUBBLES (IN FLUIDS);
GRAIN SIZE AND SHAPE;
HELIUM;
MAGNETRON SPUTTERING;
NANOSTRUCTURED MATERIALS;
SPUTTERING;
TITANIUM;
TRANSMISSION ELECTRON MICROSCOPY;
ATOMIC RATIO;
HELIUM FLUX;
HELIUM INCORPORATION;
IRRADIATION DAMAGE;
THIN FILMS;
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EID: 15444364681
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2004.11.108 Document Type: Article |
Times cited : (49)
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References (18)
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