Effect of a thin Ni layer on hydrogenation and thermal release characteristics of Ti thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2262-2266

  Shi, L Q ^a   Zhou, Z Y ^a   Zhao, G Q ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; CONCENTRATION (PROCESS); CONTAMINATION; DESORPTION; GAS ABSORPTION; HYDROGENATION; MONOLAYERS; NICKEL; PASSIVATION; TITANIUM;

THERMAL RELEASE CHARACTERISTICS;

THIN FILMS;

EID: 0034273892     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1285994     Document Type: Article

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