Helium-charged titanium films deposited by pulsed laser deposition in an electron-cyclotron-resonance helium plasma environment

Chinese Physics Letters

Volumn 20, Issue 3, 2003, Pages 386-388

  Jin, Qin Hua ^a   Hu, Pei Gang ^a   Ling, Hao ^a   Wu, Jia Da ^a   Shi, Li Qun ^a   Zhou, Zhu Ying ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BIAS VOLTAGE; CYCLOTRONS; ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; ION IMPLANTATION; PULSED LASER DEPOSITION; PULSED LASERS; SCANNING ELECTRON MICROSCOPY; THIN FILMS;

ATOMIC RATIO; BACKSCATTERING SPECTROSCOPY; ELECTRON-CYCLOTRON RESONANCE; HELIUM PLASMAS; PLASMA ENVIRONMENTS; PULSED-LASER DEPOSITION; SUBSTRATE BIAS VOLTAGES; SURFACE BLISTERING; TITANIA FILMS; TITANIUM THIN FILMS;

HELIUM;

EID: 0037351088     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/20/3/320     Document Type: Article

References (9)

1. Lasser R 1989 Tritium and Helium-3 in Metals (Berlin: Springer) ch 6, p 108
2. Thomas G J 1983 Radiat. Effects 78 37
3. Chrisey D B and Hubler G K 1994 Pulsed Laser Deposition of Thin Films (New York: Wiley) ch 10, p 280
4. Wu J D, Sun J, Zhong X X, Zhou Z Y, Wu C Z and Li F M 1999 Thin Solid Films 360 101
5. Mayer M 1997 Max-Plank-Institut fur Plasmaphysik SIMNRA 4.0
6. Greene J E and Barnett S A 1982 J. Vac. Sci. Technol. 21 285
7. Peter J 1978 Radiat. Effects 38 155
8. Ullmaier H 1983 Radiat. Effects 78 1
9. Cuomo J J and Gambino R J 1977 J. Vac. Sci. Technol. 14 152