Effect of helium partial pressure on DC-magnetron sputtering of Co Cr films

Journal of Magnetism and Magnetic Materials

Volumn 193, Issue 1-3, 1999, Pages 124-127

  Jia, H ^a   Veldeman, J ^a   Burgelman, M ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

Helium; Ion bombardment; Longitudinal magnetic thin films; Magnetron sputtering; Uniformity

Indexed keywords

ARGON; CHROMIUM; COBALT COMPOUNDS; EPITAXIAL GROWTH; HELIUM; ION BOMBARDMENT; MAGNETRON SPUTTERING; PARTIAL PRESSURE; POLYETHYLENE TEREPHTHALATES; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

ARGON SPUTTER GAS; LONGITUDINAL MAGNETIC THIN FILMS;

MAGNETIC THIN FILMS;

EID: 0033097094     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(98)00415-6     Document Type: Article

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