Study of the discharge gas trapping during thin-film growth

Vacuum

Volumn 60, Issue 1-2, 2001, Pages 89-94

  Amorosi, S ^a   Anderle, M ^b   Benvenuti, C ^a   Calatroni, S ^a   Carver, J ^a   Chiggiato, P ^a   Neupert, H ^a   Vollenberg, W ^a  

^a CERN   (Switzerland)

^b ITC IRST   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ELECTRIC POTENTIAL; FILM GROWTH; LASER ABLATION; MELTING; SPUTTERING;

DISCHARGE GAS TRAPPING;

METALLIC FILMS;

EID: 0035149256     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(00)00359-6     Document Type: Article

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