Dielectric performance of low temperature silicon nitride films in a-Si:H TFTs

Journal of Non-Crystalline Solids

Volumn 299-302, Issue PART 2, 2002, Pages 1360-1364

  Sazonov, Andrei ^a   Stryahilev, Denis ^a   Nathan, Arokia ^a   Bogomolova, Lydia D ^b  

^a UNIVERSITY OF WATERLOO   (Canada)

^b MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; DEFECTS; DIELECTRIC PROPERTIES OF SOLIDS; GATES (TRANSISTOR); HYDROGENATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; THIN FILM TRANSISTORS; THRESHOLD VOLTAGE;

ELECTRONIC DEFECTS;

THIN FILMS;

EID: 0036532181     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(01)01157-7     Document Type: Article

References (13)