A low-temperature route to thermodynamically stable ohmic contacts to n-type 6H-SiC

Applied Physics Letters

Volumn 84, Issue 7, 2004, Pages 1117-1119

  Deeb, C ^a   Heuer, A H ^a  

^a Case Western Reserve University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT RESISTANCE; SOILD-STATE REACTIONS;

AMORPHOUS FILMS; ANNEALING; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); ELECTRIC RESISTANCE; INTERFACES (MATERIALS); METALLIZING; NICKEL COMPOUNDS; SILICON CARBIDE; SINGLE CRYSTALS; THERMAL CONDUCTIVITY; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

OHMIC CONTACTS;

EID: 1542469562     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1646755     Document Type: Article

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